Committee |
Date Time |
Place |
Paper Title / Authors |
Abstract |
Paper # |
IEICE-EID, IEICE-SDM, IDY [detail] |
2020-12-02 14:30 |
Kyoto |
|
[Special Invited Talk]
Defects control in oxide semiconductors at low-temperature and its application to flexible devices Yusaku Magari, Mamoru Furuta (Kochi Univ. of Technol.) |
[more] |
|
IDY, IEICE-EID, IEIJ-SSL, SID-JC, IEE-EDD [detail] |
2020-01-24 11:10 |
Tottori |
Tottori Univ |
[Poster Presentation]
Physical properties of anodized aluminum oxide for low temperature processed IGZO thin-film transistors. Kono Shuya, Mori Marin, Koretomo Daichi, Furuta Mamoru (KUT) |
(To be available after the conference date) [more] |
|
IEICE-EID, IEICE-SDM, IDY [detail] |
2018-12-25 11:45 |
Kyoto |
|
Device Using Thin Film of GTO by MistCVD Method Yuta Takishita, Sumio Sugisaki (Ryukoku Univ.), Daichi Koretomo, Yusaku Magari, Mamoru Furuta (KUT), Tokiyoshi Matsuda, Mutsumi Kimura (Ryukoku Univ.) |
We made devices using Ga-Sn-O(GTO) thin films deposited by mist CVD method. A thin film transistor incorporating GTO pre... [more] |
IDY2018-57 pp.13-16 |
IEICE-EID, IEICE-SDM, IDY [detail] |
2018-12-25 14:30 |
Kyoto |
|
Dependence of thermoelectric properties and structure of Ga-Sn-O thin films on annealing Yoku Ikeguchi, Tatsuya Aramaki (Ryukoku Univ.), Kenta Umeda, Mutsunori Uenuma (NAIST), Daichi Koretomo, Yusaku Magari, Mamoru Furuta (KUT), Mutsumi Kimura (Ryukoku Univ.) |
Ga-Sn-O(GTO) thin films were formed using RF magnetron sputtering, and the influence of deposition pressure and crystal ... [more] |
IDY2018-59 pp.33-36 |
IST |
2016-03-11 16:20 |
Tokyo |
NHK Research Lab (Setagaya) |
Color Image Sensor with Three-stacked Organic Photoconductive Films Toshikatsu Sakai, Hokuto Seo, Tomomi Takagi, Misao Kubota, Hiroshi Ohtake (NHK), Mamoru Furuta (Kochi Univ. of Tech.) |
This paper describes a color image sensor with three stacked organic photoconductive films and transparent readout circu... [more] |
IST2016-19 pp.49-52 |
IEICE-EID, IDY, IEE-EDD, SID-JC, IEIJ-SSL [detail] |
2016-01-28 15:04 |
Toyama |
Toyama Univ. |
Plasma treatment for source/drain regions of self-aligned InGaZnO thin-film.
-- Effects of substrate bias during the plasma treatment of IGZO. -- Yusaku Magari, Tatsuya Toda, Hisao Makino, Mamoru Furuta (Kochi Univ. of Technol.) |
[more] |
|
IDY, IEICE-EID, IEE-EDD |
2013-01-25 10:10 |
Shizuoka |
Shizuoka Univ. |
Fabrication and properties of Oxide TFT with an IGZO/AlOx stack prepared by non-vacuum process "mist CVD" Toshiyuki Kawaharamura, Takayuki Uchida, Dapeng Wang, Masaru Sanada, Mamoru Furuta (KUT) |
Last year, oxide TFT consisting of channel layer (IGZO) (47 nm) and gate insulator (AlOx) (116 nm) was fabricated by mis... [more] |
IDY2013-8 pp.73-76 |
IDY, IEICE-EID, IEE-EDD, IEIJ-OMD |
2011-01-29 09:55 |
Kochi |
Kochi University of Technology |
Deposition of Insulator Film with New Facing Electrodes CVD for Low Temperature Devices Tokiyoshi Matsuda, Mamoru Furuta, Takahiro Hiramatsu, Hiroshi Furuta, Takashi Hirao (Kochi Univ. of Technol.) |
[more] |
|
IDY, IEICE-EID |
2010-11-26 15:30 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
Debriefing Session of IMID conference
-- TFT technology -- Mamoru Furuta (Kochi Univ. of Tech.) |
Topics of thin-film transistors (TFTs) related articles in international conference on information display (IMID) 2010 w... [more] |
IDY2010-82 pp.17-19 |
IST |
2008-12-16 14:00 |
Tokyo |
Univ. of Tokyo |
Stacked Organic Image Sensor with Zinc-oxide TFTs as Signal Readout Circuit Hokuto Seo, Satoshi Aihara, Masakazu Nanba, Toshihisa Watabe, Hiroshi Ohtake, Misao Kubota, Norifumi Egami (NHK), Takahiro Hiramatsu, Tokiyoshi Matsuda, Mamoru Furuta, Takashi Hirao (Kochi Uni. of Technol) |
We have studied a single-chip image sensor with stacked structure consisting of transparent readout circuits and organic... [more] |
|