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Paper Abstract and Keywords
Presentation 2021-08-18 11:00
[Invited Talk] Demonstration of HfO2-based ferroelectric ultra-thin films with low operating voltage, low process temperature, and high endurance -- Toward embedded memory in advanced technology nodes --
Kasidit Toprasertpong, Kento Tahara (Univ. Tokyo), Yukinobu Hikosaka, Ko Nakamura, Hitoshi Saito (Fujitsu Semiconductor Memory Solution), Mitsuru Takenaka, Shinichi Takagi (Univ. Tokyo)
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Conference Information
Committee IEICE-SDM IEICE-ICD IST  
Conference Date 2021-08-17 - 2021-08-18 
Place (in Japanese) (See Japanese page) 
Place (in English) Online 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Analog, Mixed Analog and Digital, RF, and Sensor Interface, Low Voltage/Low Power Techniques, Novel Devices/Circuits, and the Applications 
Paper Information
Registration To IEICE-SDM 
Conference Code 2021-08-SDM-ICD-IST 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Demonstration of HfO2-based ferroelectric ultra-thin films with low operating voltage, low process temperature, and high endurance 
Sub Title (in English) Toward embedded memory in advanced technology nodes 
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1st Author's Name Kasidit Toprasertpong  
1st Author's Affiliation The University of Tokyo (Univ. Tokyo)
2nd Author's Name Kento Tahara  
2nd Author's Affiliation The University of Tokyo (Univ. Tokyo)
3rd Author's Name Yukinobu Hikosaka  
3rd Author's Affiliation Fujitsu Semiconductor Memory Solution Limited (Fujitsu Semiconductor Memory Solution)
4th Author's Name Ko Nakamura  
4th Author's Affiliation Fujitsu Semiconductor Memory Solution Limited (Fujitsu Semiconductor Memory Solution)
5th Author's Name Hitoshi Saito  
5th Author's Affiliation Fujitsu Semiconductor Memory Solution Limited (Fujitsu Semiconductor Memory Solution)
6th Author's Name Mitsuru Takenaka  
6th Author's Affiliation The University of Tokyo (Univ. Tokyo)
7th Author's Name Shinichi Takagi  
7th Author's Affiliation The University of Tokyo (Univ. Tokyo)
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Date Time 2021-08-18 11:00:00 
Presentation Time 45 minutes 
Registration for IEICE-SDM 
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Volume (vol) vol.45 
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