| Paper Abstract and Keywords |
| Presentation |
2008-09-12 13:00
[Special Talk]
Next Generation Photopolymers for the Holographic Industry
Francois Deuber, Friedrich Bruder, Thomas Faecke, Rainer Hagen, Dennis Hoenel, David Jurbergs, Thomas Roelle (Bayer MS), Andy Volkov (Bayer plc), Marc-Stephan Weiser (Bayer MS) |
| Abstract |
(in Japanese) |
(See Japanese page) |
| (in English) |
This paper describes a new class of recording materials for volume holograms suitable for commercial applications. These next generation holographic photopolymers have combine the ability to satisfy the unmet demand for color and depth tuning that is only possible with volume holograms with compatibility to industrial mass-production processes. Unlike earlier holographic photopolymers, these new materials offer the advantages of no chemical or thermal processing combined with low shrinkage and detuning. Furthermore, these materials offer a high resolution of more than 5000 lines/mm and are environmentally robust. Bayer MaterialScience plans to commercialize these materials in 2010.
In this paper, we describe the attributes of this new class of photopolymers, relate their ease of use in holographic recording, and discuss potential applications of such materials. |
| Keyword |
(in Japanese) |
(See Japanese page) |
| (in English) |
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| Reference Info. |
ITE Tech. Rep., vol. 32, no. 36, AIT2008-89, pp. 1-4, Sept. 2008. |
| Paper # |
AIT2008-89 |
| Date of Issue |
2008-09-05 (AIT, 3DIT) |
| ISSN |
Print edition: ISSN 1342-6893 |
| Download PDF |
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| Conference Information |
| Committee |
AIT 3DMT OSJ-HODIC |
| Conference Date |
2008-09-12 - 2008-09-12 |
| Place (in Japanese) |
(See Japanese page) |
| Place (in English) |
College of Science and Technology, Nihon Univ. |
| Topics (in Japanese) |
(See Japanese page) |
| Topics (in English) |
3D Imaging and Holography |
| Paper Information |
| Registration To |
AIT |
| Conference Code |
2008-09-AIT-3DIT-HODIC |
| Language |
English |
| Title (in Japanese) |
(See Japanese page) |
| Sub Title (in Japanese) |
(See Japanese page) |
| Title (in English) |
Next Generation Photopolymers for the Holographic Industry |
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| 1st Author's Name |
Francois Deuber |
| 1st Author's Affiliation |
Bayer MaterialScience AG (Bayer MS) |
| 2nd Author's Name |
Friedrich Bruder |
| 2nd Author's Affiliation |
Bayer MaterialScience AG (Bayer MS) |
| 3rd Author's Name |
Thomas Faecke |
| 3rd Author's Affiliation |
Bayer MaterialScience AG (Bayer MS) |
| 4th Author's Name |
Rainer Hagen |
| 4th Author's Affiliation |
Bayer MaterialScience AG (Bayer MS) |
| 5th Author's Name |
Dennis Hoenel |
| 5th Author's Affiliation |
Bayer MaterialScience AG (Bayer MS) |
| 6th Author's Name |
David Jurbergs |
| 6th Author's Affiliation |
Bayer MaterialScience LLC (Bayer MS) |
| 7th Author's Name |
Thomas Roelle |
| 7th Author's Affiliation |
Bayer MaterialScience AG (Bayer MS) |
| 8th Author's Name |
Andy Volkov |
| 8th Author's Affiliation |
Bayer plc (Bayer plc) |
| 9th Author's Name |
Marc-Stephan Weiser |
| 9th Author's Affiliation |
Bayer MaterialScience AG (Bayer MS) |
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| Speaker |
Author-1 |
| Date Time |
2008-09-12 13:00:00 |
| Presentation Time |
50 minutes |
| Registration for |
AIT |
| Paper # |
AIT2008-89, 3DIT2008-48 |
| Volume (vol) |
vol.32 |
| Number (no) |
no.36 |
| Page |
pp.1-4 |
| #Pages |
4 |
| Date of Issue |
2008-09-05 (AIT, 3DIT) |